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Materials and Process Characterization
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VLSI Electronics: Microstructure Science, Volume 6: Materials and Process Characterization addresses the problem of how to apply a broad range of sophisticated materials characterization tools to materials and processes used for development and production of very large scale integration (VLSI) electronics.
This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered.
This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.
This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered.
This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.
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Titles in the series (17)
VLSI Electronics: Microstructure Science Rating: 5 out of 5 stars5/5VLSI Electronics: Microstructure Science Rating: 5 out of 5 stars5/5VLSI Electronics Rating: 0 out of 5 stars0 ratingsVLSI Electronics: Microstructure Science Rating: 5 out of 5 stars5/5Materials and Process Characterization Rating: 0 out of 5 stars0 ratingsVLSI Electronics: Microstructure Science Rating: 0 out of 5 stars0 ratingsGaAs Microelectronics: VLSI Electronics Microstructure Science Rating: 5 out of 5 stars5/5Surface and Interface Effects in VLSI Rating: 5 out of 5 stars5/5VLSI Electronics Microstructure Science Rating: 5 out of 5 stars5/5Plasma Processing for VLSI Rating: 5 out of 5 stars5/5VLSI Design Rating: 5 out of 5 stars5/5Metal – Semiconductor Contacts and Devices Rating: 0 out of 5 stars0 ratingsVLSI in Medicine Rating: 5 out of 5 stars5/5VLSI Metallization Rating: 5 out of 5 stars5/5Lithography for VLSI: VLSI Electronics Microstructure Science Rating: 5 out of 5 stars5/5Beam Processing Technologies Rating: 0 out of 5 stars0 ratingsVLSI and Computer Architecture Rating: 5 out of 5 stars5/5
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Materials and Process Characterization - Academic Press
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