Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO: Application to LSI
By Shunpei Yamazaki and Masahiro Fujita
()
About this ebook
Key features:
• Outlines the physics and characteristics of CAAC-IGZO FETs that contribute to favorable operations of LSI devices.
• Explains the application of CAAC-IGZO to LSI devices, highlighting attributes including low off-state current, low power consumption, and excellent charge retention.
• Describes the NOSRAM, DOSRAM, CPU, FPGA, image sensors, and etc., referring to prototype chips fabricated by a hybrid process of CAAC-IGZO and Si FETs.
Related to Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO
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Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO - Shunpei Yamazaki
1
Introduction
1.1 Overview of this Book
The three books in this series deal with c‐axis‐aligned crystalline indium–gallium–zinc oxide (CAAC‐IGZO), an oxide semiconductor (see Figure 1.1): Physics and Technology of Crystalline Oxide Semiconductor CAAC‐IGZO: Fundamentals (hereinafter referred to as Fundamentals) [1], Physics and Technology of Crystalline Oxide Semiconductor CAAC‐IGZO: Application to LSI (this book, hereinafter referred to as Application to LSI), and Physics and Technology of Crystalline Oxide Semiconductor CAAC‐IGZO: Application to Displays (hereinafter referred to as Application to Displays) [2]. Fundamentals describes, for example, the material properties of oxide semiconductors, the formation mechanism and crystal structure analysis of IGZO, the fundamental physical properties of CAAC‐IGZO, the electrical characteristics of field‐effect transistors (FETs) with CAAC‐IGZO active layer (hereinafter referred to as CAAC‐IGZO FETs), and comparisons between CAAC‐IGZO and silicon (Si) FETs. Application to Displays introduces applications of the CAAC‐IGZO FET technology to liquid crystal and organic light‐emitting diode displays, describing the process flows and characteristics of the FETs, the driver circuits for displays, the technologies for high‐definition, low‐power, flexible displays, and so on.
Schematic of the framework and summary of the book series dealing with CAAC-IGZO transistor, with upward arrows depicting (bottom–top) fundamentals, process technology, and applications to displays and LSI.Figure 1.1 Framework and summary of the book series
This volume, Application to LSI, aims to introduce the applications of CAAC‐IGZO FET technology to large‐scale integration (LSI) and broadly and concisely review the device physics of CAAC‐IGZO FETs. On the basis of the distinct material features of these FETs disclosed in Fundamentals, such FETs have an attractive application field in LSIs, in addition to the display applications described in Application to Displays. Not only focusing on oxide semiconductor material aspects, this book will also describe device design and fabrication using such materials, combination with other technologies, and specific applications (see Figure 1.2). Application examples of CAAC‐IGZO FET technologies to LSIs are specifically described in the subsequent chapters.
Table with a long down arrow on the left presenting the scope of this book, such as the materials, combination with other technologies, and specific applications.Figure 1.2 Scope of this book. The symbol F² means the square of the feature size F, used as an index of the memory cell size
1.2 Background
The integrated circuit (IC) has a huge market [3]. As shown in Figure 1.3, the total market size, including analog, micro, logic, and memory applications, is worth approximately 278 billion US dollars. Here, micro
applications are microprocessor units (MPUs), microcontroller units (MCUs), and digital signal processors (DSPs); logic
applications include specified logic and custom logic, such as field‐programmable gate arrays (FPGAs) and application‐specific integrated circuits (ASICs). CAAC‐IGZO FETs address this vast IC market.